Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1686768 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2010 | 6 Pages |
Abstract
Silicon has been machined on lateral resolutions of micrometers and on depth resolutions of nanometers using a recently-developed process based on ion irradiation and electrochemical anodisation. Here we investigate its use as a recording medium for computer generated hologram patterns. We describe the fabrication of both amplitude and phase binary modulated reflective computer generated hologram patterns on a silicon surface with pixel sizes of 5 μm. We further discuss the use of micromachined silicon to variably modulate both amplitude and phase in a continuous, rather than a binary fashion.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Y.S. Ow, M.B.H. Breese, Y.R. Leng, S. Azimi, E.J. Teo, X.W. Sun,