| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1687055 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2006 | 9 Pages |
Abstract
The release properties of a UCx thick target associated with a hot plasma ion source have been studied. Measurements have been performed for various elements: Kr, Ag, Sn, I and Xe. The analysis is made assuming pure diffusion or pure effusion as the release processes. The results obtained are compared to the data available in the literature.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
B. Roussière, O. Bajeat, N. Barré, C. Bourgeois, F. Clapier, E. Cottereau, C. Donzaud, M. Ducourtieux, S. Essabaa, D. Guillemaud-Mueller, F. Ibrahim, C. Lau, F. Le Blanc, H. Lefort, C.F. Liang, A.C. Mueller, J. Obert, N. Pauwels, J.C. Potier,