Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1687288 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2009 | 4 Pages |
Abstract
In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, we have produced three-dimensional micro/nano-structures with high aspect ratio using cross linking process based on negative resist such as SU-8 by a technique of mask less ion beam lithography. By bombarding high energy heavy ions such as 450Â MeV Xe23+ to SU-8, on the other hand, it appeared that a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment for this purpose using a combination of 15Â MeV Ni4+ ion microbeam patterning and the 450Â MeV 129Xe23+ hitting on SU-8.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
T. Kamiya, K. Takano, Y. Ishii, T. Satoh, M. Oikawa, T. Ohkubo, J. Haga, H. Nishikawa, Y. Furuta, N. Uchiya, S. Seki, M. Sugimoto,