Article ID Journal Published Year Pages File Type
1687640 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2008 4 Pages PDF
Abstract

Ion implantation is a process in which ions are accelerated toward a substrate at energies high enough to bury them just below the surface substrate in order to modify the surface characteristics. Laser-produced plasma is a very suitable and low cost technique in the production of ion sources. In this work, a laser ion source is developed by a UV pulsed laser of about 108 W/cm2 power density, employing a C target and a post ion acceleration of 40 kV to increase the ion energy. In this work, we implanted C ions on ultra-high-molecular-weight-polyethylene (UHMWPE) and low-density polyethylene (LDPE). We present the preliminary results of surface property modifications for both samples. In particular, we have studied the modifications of the surface micro-hardness of the polymers by applying the “scratch test” method as well as the hydrophilicity modifications by the contact angle measurements.

Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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