| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1687784 | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms | 2007 | 6 Pages |
Abstract
Deep buried layered microstructures have many potential applications as sensors, micro-electro-mechanical systems (MEMS), and optical devices, but it has always been challenging to obtain a minimum number of process steps to produce these structures. A single step ion irradiation process has been used to fabricate buried tunnels with 3 MeV P-beam writing by utilizing enhanced end-of-range damage in thick polymethylmethacrylate (PMMA). Creation of the buried tunnels in PMMA with a single energy irradiation step was found to be strongly dependent on the ion fluence and chemical developing process. The fabrication of a modular large scale complex pattern involving tunneled microstructures is presented as an example of this novel technique.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
B. Rout, M. Kamal, A.D. Dymnikov, D.P. Zachry, G.A. Glass,