Article ID Journal Published Year Pages File Type
1687985 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2006 6 Pages PDF
Abstract

Nitrogen plasma immersion ion implantation (PIII) was applied to Pebax thin films and plates using doses ranging from 5 × 1014 to 1017 ions/cm2 at applied voltages of 5, 10, 20 and 30 kV. The analysis of the Pebax structure after implantation was performed using FTIR ATR, Raman, UV–vis transmission spectra, tensile and AFM contact mode data. The carbonization and depolymerisation processes were observed in the surface layer of Pebax. It was found, that graphitic- and diamond-like structures in Pebax are formed at PIII treatment of 30 kV applied voltage. AFM measurement data showed that the hardness of the Pebax surface layer increased sharply at PIII treatment with a dose higher then 1016 ions/cm2. The bulk mechanical properties of the Pebax film after PIII remained unchanged.

Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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