Considerations for the physical vapor deposition of high molar mass organic compounds

The challenges related to the deposition of high molar mass organic compounds by physical vapor deposition (PVD) are of importance to those developing new organic electronic devices and materials. In this study we report on strategies to maximize film uniformity and mass yield within the context of rapid screening of newly prepared organic semiconductors using small amounts of these highly valuable materials. We propose guidelines for maximizing mass utilization by way of thermal source type and its position selection and tooling factor prediction. As an aside, we also highlight that fluorination of subphthalocyanine (subPc) related compounds increases their vapor pressure, despite a corresponding increase in molar mass.