Article ID Journal Published Year Pages File Type
1688590 Vacuum 2013 7 Pages PDF
Abstract
► Deposition of magnesium silicide films on silicon (100) substrates. ► Using plasma focus device for the specific film deposition. ► Interactions between high energy magnesium ions and silicon (100) substrates. ► Analysis of structural properties of deposited films using XRD spectra. ► Analysis of surface morphology of deposited films using SEM and AFM images.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Preview
Fabrication of magnesium silicide thin films by pulsed ion beam ablation in a 1.6 kJ plasma focus device
Authors
, , , ,