Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1688602 | Vacuum | 2014 | 7 Pages |
•Scattering yields of multicharge Ar ions were measured on ZnO surfaces.•The yields had a peak near the specular reflection angle.•Maximum yields of (0001¯) surfaces were twice as large as those of (0001) surfaces.
The angular (φ-) dependences of the yields of scattered ions and neutrals were measured when 8–80 keV Ar8+ ions were obliquely incident on the single-crystalline ZnO (0001) and (0001¯) surfaces at small incidence angles of ψ = 5, 7, and 9° measured relative to the plane of the surface. The φ dependences of the yields had a peak near the specular reflection angle that is φ ∼ 2ψ . The maximum yields of the (0001¯) surfaces at the peaks were almost twice as large as those of the (0001) surfaces at each incidence angle ψ for a given energy E. A faint difference between the two polarity surfaces was observed in the ψ-dependences of the maximum yields. The influence of the surface polarity on the scattering processes was examined by comparison with simulated results.