Amorphous SiCN diaphragm for transmission electron microscope with environmental-cell fabricated by plasma-enhanced chemical vapor deposition

For use as a diaphragm in an environmental-cell transmission electron microscope (E-cell TEM) system, amorphous silicon carbon nitride (a-SiCN) films were applied to a Cu grid with 100-μm-diameter holes by plasma-enhanced chemical vapor deposition. The applied films were characterized by X-ray photoelectron spectroscopy and TEM and their capacity to resist pressure were measured. The films were amorphous and transparent at 200 kV and no charge-up was observed. The films had a resist pressure of about 100 kPa. Gold nanoparticles in the reaction gas could be observed in-situ by using the developed diaphragm in the E-cell TEM system.