Characterizations of CrN/a-CNx nanolayered coatings deposited by DC reactive magnetron sputtering of Cr and graphite targets

CrN/a-CNx nanolayered coatings have been deposited by DC reactive magnetron sputtering of pure Cr and graphite targets. The total thickness is 1 μm and that of a-CNx layers is kept constant at 3.5 nm. The period (bilayer thickness) is in the range 8–16 nm. CrN and a-CNx layers are crystalline and amorphous respectively. The decrease of CrN layers’ thickness (decrease of period) in the stack leads to refinement of CrN microstructure associated with (200) preferred orientation. The hardness of nanolayered films is independent of the period’s thickness, while internal compressive stress, which remains between that of each elementary layer, follows an evolution close to that of the law of mixtures. The best tribological behaviours are reached for a periods’ thickness of 8 nm.

►CrN/a-CNx nanolayered coatings deposited by reactive sputtering of Cr and C targets. ►Decrease of CrN layers’ thickness in the stack leads to refinement of CrN structure. ►Hardness of nanolayered films is independent of the period’s thickness. ►Compressive stress follows an evolution close to that of the law of mixtures. ►The best tribological behaviours are reached for a period’s thickness of 8 nm.