| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1688906 | Vacuum | 2012 | 6 Pages |
Abstract
⺠Large amounts of byproduct particles are exhausted during cleaning process. ⺠Vacuum pump performance decreases with build-up of byproduct particles. ⺠A low-pressure plasma device is proposed to reduce the size and quantity of byproduct particles. ⺠Plasmas make the size and quantity of byproduct particles much smaller.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
M. Hur, J.O. Lee, H.A. Yoo, W.S. Kang, Y.H. Song, D.G. Kim, S.Y. Lee,