| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1688919 | Vacuum | 2012 | 6 Pages |
Abstract
⺠DC reactive sputtered ZnO:Al thin films have been prepared using a Zn:Al metallic target and plasma emission monitoring (PEM) control system. âºÂ The relationship between the optical, electrical and structural properties of ZnO:Al thin films is discussed. ⺠A modified formula for the figure of merit is introduced and used in determining the optimum TCO conditions for the ZnO:Al films.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
P.D. Nsimama, G.A. Niklasson, M.E. Samiji, G.W. Mbise, J. Wennerberg,