Article ID Journal Published Year Pages File Type
1689033 Vacuum 2016 6 Pages PDF
Abstract
The influence of a pressure of gas mixture (10 vol% O2 + 90% N2) on an average size of copper oxide nanoparticles, produced in the plasma of low pressure arc discharge, has been studied as a basic process variable. A correlation between the dependence of average particle size on gas mixture pressure and the dependence of discharge gap voltage on product of interelectrode distance by a gas mixture pressure, has been found. The estimation was carried out by means of X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HRTEM). A mathematical model of the cathode region, which shows the applicability of the similarity theory to the low pressure arc discharge, has been represented.
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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