Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1689058 | Vacuum | 2010 | 5 Pages |
Abstract
In this paper, we described how to control the magnetic junction critical dimension (CD) and profile defined by ion beam milling and its implication to device performance. The impact of standing waves on breaking the photo-resist and on the resultant junction defects have been highlighted. The ideal device profile and geometry are also discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Xilin Peng, Zhongyan Wang, Yongxiong Lu, Brendan Lafferty, Thomas McLaughlin, Mark Ostrowski,