Article ID Journal Published Year Pages File Type
1689058 Vacuum 2010 5 Pages PDF
Abstract

In this paper, we described how to control the magnetic junction critical dimension (CD) and profile defined by ion beam milling and its implication to device performance. The impact of standing waves on breaking the photo-resist and on the resultant junction defects have been highlighted. The ideal device profile and geometry are also discussed.

Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Authors
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