Article ID Journal Published Year Pages File Type
1689183 Vacuum 2010 4 Pages PDF
Abstract

To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.

Keywords
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
Authors
, , , , ,