Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1689183 | Vacuum | 2010 | 4 Pages |
Abstract
To develop ECR plasma source for industrial applications, we produced a large diameter ECR plasma and examined radial profiles of the ion saturation current as a function of pressure and power. It was found that ECR plasma uniform over 300 mm is produced for pressures higher than 1 mTorr and the electron temperature decreases with increasing pressures.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Yoshinobu Kawai, Kiichiro Uchino, Hiroshi Muta, Shinji Kawai, Tobias Röwf,