| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1689232 | Vacuum | 2008 | 8 Pages |
Abstract
Radio frequency (RF) magnetron sputtering is a promising deposition technique that can produce dense and well-adhered films. This technique is applied to deposit thin HA films on titanium oral implants, which have exhibited excellent bioactive behavior. In this paper, the influence of key deposition parameters, including discharge power, gas composition, process pressure, base pressure, substrate temperature, bias, target-substrate distance on the properties of bioactive films are reviewed. Besides, other influencing factors such as post-deposition heat treatments and initial target materials are also introduced. At last, the future application of RF magnetron sputtering in biomedicine is presented.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
J.Z. Shi, C.Z. Chen, H.J. Yu, S.J. Zhang,