Article ID Journal Published Year Pages File Type
1689265 Vacuum 2008 9 Pages PDF
Abstract
Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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