Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1689265 | Vacuum | 2008 | 9 Pages |
Abstract
Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30Â nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3Â h.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Vishwas S. Purohit, A.B. Bhise, Shirshendu Dey, M.A. More, C.V. Dharmadhikari, D.S. Joag, Renu Pasricha, S.V. Bhoraskar,