| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1689266 | Vacuum | 2008 | 4 Pages |
Abstract
Ti–Al–Zr alloy was implanted with Al at cumulative doses between 1 × 1017 and 1 × 1018 ions/cm2. The results indicate that the Al-implanted layers are ∼0.1 μm thick and are composed almost entirely of an amorphous layer. Implanted layer hardness is dose dependent and is increased by more than a factor of 4 for the high-dose implanted specimen when compared with that of the substrate material. The corrosion resistance of the sample was markedly improved after aluminum implantation.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Y.Z. Liu, X.T. Zu, L. Wang, S.Y. Qiu,