Features of pulse substrate bias voltage generation with electron tubes

Features of pulse substrate bias voltage generation with electron tubes in different operation modes are considered. The overstressed mode with low anode voltage and return of electrons to the grid has practical significance at bias voltages in the kilovolt range under the conditions of large substrate current fluctuations. This mode ensures small bias voltage fluctuations and effective use of the primary DC voltage. When the substrate current spontaneously rises above the critical value, the tubes automatically decrease the bias voltage and suppress current spikes and arcing. Such approach may be used in PVD processes, for ion surface treatment and ion plasma immersion implantation.