| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1689365 | Vacuum | 2015 | 6 Pages |
Abstract
The effect of electro-annealing in vacuum and air on the optical and electrical properties of ITO thin films grown by large area DC magnetron sputtering was investigated. Moreover, the performances of the electro-annealed ITO thin films in vacuum and air were compared. Electro-annealing was performed by applying 0.75, 1.00, 1.25 and 1.50 A constant ac current to the ITO thin films. It was observed that the crystallinity of the films was better for the ITO thin films electro-annealed in vacuum. The changes in sheet resistance of electro-annealed ITO thin films with applied currents were detailed. The transmittance of the films increased for both electro-annealing in vacuum and air. A correlation between band-gap and resistivity for all of the electro-annealed thin films was observed.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Hasan Koseoglu, Fulya Turkoglu, Metin Kurt, Mutlu D. Yaman, Fatime G. Akca, Gulnur Aygun, Lutfi Ozyuzer,