| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1689590 | Vacuum | 2009 | 4 Pages |
Abstract
A new method, semi-analytical method (SAM), is first applied to calculate and analyze the magnetic filed in unbalanced magnetron sputtering system, and introduced in detail. An analytic solution of the scalar magnetic potential in the system can be acquired by the SAM. Its unknown number is much less than that in the numerical method. The analytic series expression of magnetic flux density can be easily obtained directly by differentiating the scalar magnetic potential function, and it can also easily ensure the precision of solving the magnetic flux density. The comparison of results between the values measured by experiment and the values calculated by the SAM has shown correctness and effectiveness of this method. The SAM cannot only accurately describe the distribution of magnetic flux density and optimize magnetic field in unbalanced magnetron sputtering system, but also be conveniently used for the simulation about plasma distribution and thin film growth.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Liang Han, YuQing Zhao, YanWu Wang,