| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1689618 | Vacuum | 2007 | 6 Pages |
Abstract
CuO nanowires were formed on copper-coated silicon substrates by a wet chemical process, immersing them in a hot alkaline solution. The effect of hydrogen plasma treatment on the field emission characteristics of the CuO nanowires was investigated. The results showed that hydrogen plasma treatment enhanced the field emission characteristics of the CuO nanowires showing a decrease in turn-on voltage as well as an increase of field enhancement factor. It is believed that hydrogen plasma treatment plays an important role in the improvement of field emission characteristics of CuO emitters.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Woo-Yong Sung, Wal-Jun Kim, Seung-Min Lee, Ho-Young Lee, Yong-Hyup Kim, Kyung-Ho Park, Soonil Lee,