Article ID Journal Published Year Pages File Type
1689793 Vacuum 2007 8 Pages PDF
Abstract
Computer simulation is explored to study the formation of the niobium film nanostructure by low-temperature deposition. The dependence of dynamical evolution of surface morphology with respect to film thickness is investigated. Calculations of the film density variation at 300 and 800 K are performed. It has been established that the formation of the microcracks elongated along the crystallographic 〈1 0 0〉 direction was the result of surface instabilities during film growth. The internal microstresses arising in the films were evaluated. It has become apparent that the whole complex of phenomena: the porosity formations, the block structure development, the internal microstresses, taking place in the low-temperature deposition, are involved in surface instabilities during niobium film growth.
Related Topics
Physical Sciences and Engineering Materials Science Surfaces, Coatings and Films
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