Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1689793 | Vacuum | 2007 | 8 Pages |
Abstract
Computer simulation is explored to study the formation of the niobium film nanostructure by low-temperature deposition. The dependence of dynamical evolution of surface morphology with respect to film thickness is investigated. Calculations of the film density variation at 300 and 800Â K are performed. It has been established that the formation of the microcracks elongated along the crystallographic ã1Â 0Â 0ã direction was the result of surface instabilities during film growth. The internal microstresses arising in the films were evaluated. It has become apparent that the whole complex of phenomena: the porosity formations, the block structure development, the internal microstresses, taking place in the low-temperature deposition, are involved in surface instabilities during niobium film growth.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Ivan G. Marchenko,