Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1690339 | Vacuum | 2007 | 4 Pages |
Abstract
A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO2/SiSiO2/Si substrate. Samples were irradiated by 4 MeV Cl2+Cl2+ ions with fluences of 1015–1016ions/cm2. The combined use of pick’n place positioning of the small porous alumina templates and ion beam irradiation is well suited for post-processing on silicon based integrated circuits. It provides fast local deposition at low temperature of high-density ordered carbon nanopillar arrays in larger silicon based systems, e.g., for field emitting or biosensors applications.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
M. Skupiński, A. Johansson, T. Jarmar, A. Razpet, K. Hjort, M. Boman, G. Possnert, J. Jensen,