Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1690343 | Vacuum | 2013 | 4 Pages |
Aluminum oxide films were deposited on fused silica and borosilicate glass substrates by electron beam evaporation, without any substrate heating. Grazing incidence X-ray diffraction measurements found that a layer of crystalline aluminum silicate hydroxide was formed at the interface of the substrate and the amorphous alumina film, the latter transformed to γ-alumina phase on heat treatment at 800 °C. The aluminum silicate hydroxide layer was produced by the chemical reaction between condensing Al and Al–O species, OH− from the residual water vapors in the chamber and Si atoms from the underlying silica and borosilicate glass substrates.
► Growth of interfacial aluminum silicate hydroxide layer during deposition of alumina coatings. ► Silicate layer forms due to reaction between Al–O species and Si atoms in the glass substrates. ► Top layer is amorphous alumina that crystallizes into gamma phase on annealing at 800 °C. ► Feasibility of growth of mullite layers without high temperature substrate heating.