| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1690527 | Vacuum | 2012 | 4 Pages |
Abstract
⺠We examined the etching mechanism. ⺠Erosion of Si is dominated by formation of SiF3. ⺠The formed reaction layer mainly consists of CF and SiF.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
C. Zhao, X. Lu, P. He, P. Zhang, W. Sun, J. Zhang, F. Chen, F. Gou,