Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1690772 | Vacuum | 2010 | 5 Pages |
Abstract
Hard, nanocomposite aluminum magnesium boride thin films were prepared on Si (100) substrates with a three target magnetron sputtering system. The films were characterized by X-ray diffraction, atomic force microscope, electron micro-probe, Fourier transform infrared spectroscopy and nanoindentation. The results show that the maximum hardness of the as-deposited films is about 30.7 GPa and these films are all X-ray amorphous with smooth surfaces. The influences of substrate temperature and boron sputtering power on the quality of the films are discussed. From the results of this work, magnetron sputtering is a promising method to deposit Al–Mg–B thin films.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Zhanling Wu, Yizhen Bai, Wenchao Qu, Aimin Wu, Dong Zhang, Jijun Zhao, Xin Jiang,