| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1690773 | Vacuum | 2010 | 4 Pages |
Abstract
Molecular dynamic simulation has been used to study how the sputtering characteristics of metal polycrystals are dependent on the mass m1 of bombarding ions of low-energy E0. The influence of target parameters on mass dependence of sputtering has been calculated for Al, Ba, Ce and Au, which were not previously studied. These metals have very different values of density ρ, the lattice constant d, and the surface binding energy Eb (the parameters that define the sputtering process). The features of sputtering characteristics for the metals studied are discussed.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
E.Yu. Zykova, A.S. Mosunov, J.S. Colligon, V.E. Yurasova,