| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1690906 | Vacuum | 2011 | 5 Pages |
Abstract
⺠It is deposited helium based hydrogenated silicon thin film with high pressure depletion (HPD) condition. ⺠We could find a depletion point using optical emission spectroscopy (OES). ⺠Hydrogen comes from SiH4 using He-SiH4 mixture so we tried to explain how SiH4 dissociated and contribute to deposition.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
In kyo Kim, Jong Hyeuk Lim, Geun Young Yeom,