| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1691288 | Vacuum | 2008 | 5 Pages |
Abstract
Molecular beam epitaxy (MBE) is presented as a powerful and flexible technology for research and development (R&D) as well as for mass production of nanoelectronic structures, based on a huge variety of materials. Its historical background, basic properties, advantages-in particular the production potential-as well as some trends in the field are shown.
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Kamil Kosiel,