| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1691290 | Vacuum | 2008 | 4 Pages |
Abstract
Atomic force microscopy (AFM) and Raman spectroscopy were used to investigate the physical and chemical parameters of DLC films after deposition process. The electrical parameters of capacitors with the DLC layer as an insulator were extracted from the capacitance-voltage (C-V) and current-voltage (I-V) characteristics. Measurements of the field emission were performed after characterization of the layer properties.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Ryszard Gronau, Jan Szmidt, Piotr Firek, Elżbieta Czerwosz, Dagmara JarzyÅska, Elżbieta Staryga,