Studies of medium frequency high power density magnetron sputtering discharges

Optical emission spectroscopy and Langmuir probe have been used to study the power dependence of medium frequency, 100 kHz, pulsed magnetron sputtering discharge. Copper target was sputtered in the argon atmosphere. The examined power ranged from 0.5 to 4.5 kW which gave an average power density on target surface from 25 to 115 W/cm2. Optical spectroscopy did not reveal any significant changes of copper ion contribution to the sputtering process. The electron temperature and plasma potential changed a little with applied power. The electron density depended linearly on the sputtering power.