Optimum structure of metal oxide under-layer used in Ag-based multilayer

The effects of a metal oxide under-layer on the resistivity of a Ag layer were investigated. Ag-based multilayers, which have a layer construction of glass/ZnO under-layer/Ag/ZAO (Al-doped ZnO) blocker/ZnO top layer, were deposited by DC magnetron sputtering with changing the sputter gas pressure during the under-layer deposition and it was confirmed that the Ag layer showed low resistivity when the smooth crystallized ZnO under-layer was employed. On the other hand, in the case of the Ag-based multilayer using the smooth amorphous-SnO2 under-layer, it was found that the Ag layer was poorly crystallized and showed higher resistivity than the Ag layer using the ZnO under-layer. This comparative study indicated that the ZnO under-layer promoted the preferred crystal growth of the Ag layer.