A novel magnetron sputtering for flexible coatings as a function for production of high quality films

A novel sputtering technique combining the symmetric compressive magnets with cylindrical cathode has been developed to mass produce high-quality oxide and nitride films on plastic sheets. The discharge characteristics of our sputtering can supply about three times larger power efficiencies than that of the conventional magnetron sputtering. Moreover, in continuous dielectric sputtering experiments, the substrate temperature was kept lower than 60 °C. The refractive index of SiNX and SiO2 thin film at 500 nm is 1.86 and 1.46 respectively. Moreover, 4 layered anti-reflection coatings of silicon nitride and oxide films deposited on both sides of the PET sheet is achieved to fabricate, and the reflection less than 1% is realized in the range from 420 to 680 nm.