| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 1691731 | Vacuum | 2006 | 4 Pages |
Abstract
DC magnetron sputtering was carried out using a microwave plasma to enhance the ionization of sputtered aluminum atoms at a low gas pressure. The ionization fraction of sputtered aluminum atoms measured using a gridded thickness monitor was 40% at a low gas pressure of 0.05 Pa. The collision frequency for the ionization of sputtered aluminum atoms calculated theoretically under the assumption of electron-impact ionization was in good agreement with the experimental results.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Akira Yonesu, Suguru Watashi, Mituaki Yoshimi, Yasumasa Yamashiro,