Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1691760 | Vacuum | 2006 | 4 Pages |
Abstract
A novel process for growth of carbon nanotubes using plasma processes is reported. This process consists of formation of nanotips on substrate and growth of carbon nanotubes on it. The formation of the nanotips, which were formed under an intention to control formation of catalyst nanoparticles, was carried out on substrates by reactive ion etching. After the nanotips formation, the carbon nanotubes were grown on the substrate by plasma-enhanced chemical vapor deposition. Our results showed that the introduction of the nanotips on surface gave lower density and smaller diameter growth of carbon nanotubes than those without the structure.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Surfaces, Coatings and Films
Authors
Hideki Sato, Takamichi Sakai, Mai Matsubayashi, Koichi Hata, Hideto Miyake, Kazumasa Hiramatsu, Akinori Oshita, Yahachi Saito,