Fundamental Study on Sputter Deposition of Ceramic Film by Large-Area Electron Beam Irradiation

The sputter deposition of ceramic film on metal mold steel surface by large-area electron beam (EB) irradiation was discussed. The large-area EB has high energy density enough to generate plasma above the workpiece surface during the surface smoothing process, which causes the sputtering of target material set near the workpiece surface. The sputter deposition of target material with simultaneous surface melting and resolidification of workpiece surface by large-area EB would improve the adhesion between the deposited film and the workpiece. Short ceramic tube made of alumina or zirconia as a target was put on the substrate surface of steel, and large-area EB was irradiated to the surface. The workpiece surface component and structure after the irradiation were investigated using EDX and XRD analysis, in order to discuss the possibility of large-area EB irradiation as a new coating method.