Profile of an unsuccessful process and the criteria for a successful process for the chemical vapor infiltration process

A model for chemical vapor infiltration is analyzed. Consider a cylindrical pore with a reacting and carrier gas flowing in from the left. The gas reacts with the interior of the pore and the result is a solid matrix. The model assumes that the flux due to binary diffusion is negligible. The model also assumes that the reactions are first order.A process is successful if the void remaining in the preform is less than some tolerance. The results yield the profile of an unsuccessful process and the criteria for a successful process.