Systems and control challenges in photovoltaic manufacturing processes: A modeling strategy for passivation and antireflection films

A view of contemporary systems and control challenges in photovoltaic cell manufacturing is given in this paper, with emphasis on developing a modeling strategy for the optimization of silicon nitride SiNx:H films used for passivation and antireflection coatings in single and multicrystalline silicon solar cells. The overall framework integrates three modeling modules: a remote plasma-enhanced chemical vapor deposition reactor process model that predicts film composition and thickness based on process input parameters, a solar-optical module that relates antireflection film physical and chemical properties to the degree to which the spectral irradiance distribution is attenuated, and a solar cell device model that predicts cell power output and efficiency from the film properties and irradiance. Because the model couples process inputs to both photovoltaic cell performance and manufacturing process efficiency, the modeling approach can be used for the simultaneous optimization of process and product performance.

► Si solar cell manufacturing overview. ► Integration of device and antireflection film deposition process modeling approaches. ► Physically based modeling of PV cell performance. ► Optimization of PV cell efficiency as a function of deposition process conditions.