Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1784469 | Infrared Physics & Technology | 2012 | 4 Pages |
Dilute nitride InAsN epitaxial layers were produced using both liquid phase and molecular beam epitaxial growth techniques. The spectral features in the photoluminescence of samples containing up to 1% N with emission energies in the mid-infrared spectral region are described and compared. The emission intensities of both LPE and MBE grown materials were found to be comparable. Increasing the N content in the InAsN alloys resulted in a significant increase in the activation energy for thermal quenching of the photoluminescence emission due to a combination of lowering of the conduction band edge and Auger de-tuning.
► Comparison between LPE and MBE growth methods. ► Successful mid-infrared emission from both LPE and MBE material with nitrogen contents as high as 1%. ► Narrower FWHM and XRD obtained from LPE material. ► Superior activation energies from MBE increasing with N due to de-tuning of Auger recombination.