Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1790477 | Journal of Crystal Growth | 2014 | 4 Pages |
•We investigated the growth temperature dependence of Ga2O3 homoepitaxial films.•Atomically smooth Ga2O3 films were obtained at growth temperatures of 550–650 °C.•The doping delay of Sn in Ga2O3 occurred at higher than 600 °C.•High-quality Ga2O3 films can be obtained in a narrow Tg range of 550–570 °C.
We investigated the growth temperature dependence of the structural and electrical properties of Sn-doped Ga2O3 homoepitaxial films grown on single-crystal β-Ga2O3 (010) substrates by molecular beam epitaxy. Ga2O3 films with an atomically smooth surface were obtained at growth temperatures of 550–650 °C. On the other hand, a delay in the incorporation of Sn atoms in Ga2O3, which was probably due to segregation, occurred in the initial stage of growth at higher than 600 °C. To ensure that Sn-doped Ga2O3 films with both high crystal quality and accurately controlled carrier density are obtained, the optimum growth temperature should be set at 540–570 °C.