Article ID Journal Published Year Pages File Type
1791161 Journal of Crystal Growth 2013 4 Pages PDF
Abstract
► AlN epitaxial lateral overgrowth has been performed successfully. ► Faster and more homogeneous coalescence for sapphire miscut 0.25° m compared to 0.25° a. ► A low V/III ratio increases the lateral growth rate. ► Coalescence thickness is clearly determinable in-situ.
Related Topics
Physical Sciences and Engineering Physics and Astronomy Condensed Matter Physics
Authors
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