Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1791250 | Journal of Crystal Growth | 2013 | 4 Pages |
Nanocrystalline ZnO thin films were deposited on glass substrates via the atomic layer deposition (ALD) method at different temperatures ranging from 50 to 200 °C. The influences of deposition temperature on the film growth mode, growth rate, optical and mechanical properties of the ZnO films were investigated. At a critical temperature of 100 °C, ZnO films exhibited a series of changes. X-ray diffraction (XRD), atomic force microscopy (AFM), UV–vis spectra, room temperature photoluminescence (PL) spectra and nano-indentation measurement were used to analyze these variations.
► Nanocrystalline ZnO thin films were deposited on glass substrates via atomic layer deposition (ALD) method. ► The influences of deposition temperature on the film growth mode and growth rate of the ZnO films were investigated. ► The XRD spectrum shows a critical temperature of the ZnO (002) preferred orientation is 100 °C. ► Nano-indentation reveals that the hardness of (002)-orientation ZnO films increases with the increase of grain size. ► Increasing deposition temperature will decrease the optical band gaps of ZnO thin films but increases refractive index.