Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
1791440 | Journal of Crystal Growth | 2012 | 7 Pages |
An original numerical technique is used to very efficiently simulate the global heat transfer and 3D melt flow in the Czochralski growth of large silicon crystals under the effect of a transverse magnetic field. Several problems are solved including the simulation of an industrial-size furnace while a comparison is successfully drawn with the literature. The Hartmann and parallel layers located along the crystal and crucible walls are well-captured by our method and show to play a key role in the solution iterative search and to strongly affect the transport of oxygen to the crystal.
► A new numerical technique is developed for CZ silicon growth global simulation. ► This method is applied to transverse magnetic field assisted growth. ► Our approach reduces dramatically the computational time of this 3D problem. ► The crystal and crucible Hartmann and parallel layers are well-captured. ► A comparison is successfully drawn with published results from the literature.