Critical thickness of the 2-dimensional to 3-dimensional transition in GaSb/GaAs(001) quantum dot growth

The phase transformation from planar to quantum dot growth is driven by strain energy reduction at the cost of surface energy. By calculating and comparing the strain energies of monolayer thick GaSb and InAs films on GaAs(001), a critical thickness for the 2-dimensional to 3-dimensional phase transformation of about 1.2 ML was derived for the GaSb/GaAs quantum dot system. This value is in agreement with the direct observation of the effectively deposited amount of material using cross-sectional scanning tunneling microscopy. Deviating experimental literature values can be traced back to the neglect of the Sb-for-As exchange process.

► Critical thickness of GaSb/GaAs(001) quantum dots growth. ► Cross-sectional scanning tunneling microscopy structure determination. ► Strain energy calculation of wetting layer for phase transformation to quantum dots. ► Explanation of previously inconsistent values for the critical thickness. ► For GaSb/GaAs(001) a critical thickness of about 1.2 monolayer is derived by experiment and theory.