Growth of vertical and defect free InP nanowires on SrTiO3(001) substrate and comparison with growth on silicon

We present a study of the molecular beam epitaxy of InP nanowires (NWs) on (001) oriented SrTiO3 (STO) substrates using vapor liquid solid mechanism and gold–indium as metal catalyst. The growth direction of InP NWs grown on STO(001) is compared with NWs grown on (001) and (111) oriented silicon substrates. Gold–indium dewetting under a flux of indium results in the majority of InP NWs growing vertically from the surface of STO(001). With the growth parameters we have used the NWs have a pure wurtzite structure and are free of stacking faults and cubic segments. The structural quality of the NWs is confirmed by micro-photoluminescence measurements showing a narrow peak linewidth of 6.5 meV.

► This is an important demonstration of InP 〈0001〉 wires grown vertically on a Si (100) substrate. ► We demonstrate a correlation between indium underlayer and vertical nanowire growth. ► We demonstrate the epitaxial relationship between InP nanowires and STO substrate.