Epitaxial growth of Sm(Co,Cu)5 thin film on Al2O3(0 0 0 1) single-crystal substrate

Sm(Co,Cu)5 epitaxial thin film with c-axis perpendicular to the substrate surface is successfully prepared on Al2O3(0 0 0 1) substrate employing Cu(1 1 1) single-crystal underlayer, while Sm–Co amorphous layers grow on Ru(0 0 0 1) and Co(0 0 0 1) underlayers as well as when deposited directly on Al2O3(0 0 0 1) substrate. The Sm(Co,Cu)5 epitaxial thin film has a bi-crystalline structure whose orientations are rotated around the film normal by 30° each other. The Cu underlayer plays an important role in assisting the formation of Sm(Co,Cu)5 epitaxial thin film.