Article ID Journal Published Year Pages File Type
1795363 Journal of Crystal Growth 2007 4 Pages PDF
Abstract
β-FeSi2 film on Si(0 0 1) substrate was prepared by molecular beam epitaxy method using an Fe source. The crystallographic orientation of β-FeSi2 film on Si(0 0 1) substrate was characterized by using X-ray diffraction. Using scanning electron microscopy, surface morphology and film thickness of samples were observed and estimated, respectively. The mobility of β-FeS2 film on Si(0 0 1) substrate were also characterized by Hall measurement at room temperature. A part of the enhancement of figure of merit was evaluated as the functions of mobility and crystallographic orientation of samples.
Related Topics
Physical Sciences and Engineering Physics and Astronomy Condensed Matter Physics
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