A new photocatalyzer InNxOy film grown by ArF excimer laser-induced MOCVD at low temperature (RT∼200 °C)

Using the ArF excimer laser-induced MOCVD method, InNxOy thin films are grown on a glass substrate. The photolytical decomposition of NH3 enables to grow them even at room temperature. It is found that the InNxOy thin films grown at a temperature less than 250 °C show an excellent photocatalytic decomposition of H2S under UV irradiation, while the activity of the films grown at a temperature higher than 300 °C is very small, less than 14 of that for the low-temperature films. The excellent photocatalytic activity for the low-temperature films is closely related to the amorphous phase of the films.